Price of fully automatic spectrophotometer

NegotiableUpdate on 01/18

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Olympus' USPM-RU-W near-infrared microspectrometer can perform high-speed and high-precision spectroscopic measurements of a wide range of wavelengths from the visible light region to the near-infrared region. Due to its ability to easily measure the reflectivity of subtle areas and curved surfaces that cannot be measured by conventional spectrophotometers, Z is suitable for optical components and small electronic components.

Product Details

Olympus'USPM-RU-W Near Infrared MicrospectrometerIt can perform high-speed and high-precision spectral measurements of a wide range of wavelengths from the visible light region to the near-infrared region. Due to its ability to easily measure the reflectivity of subtle areas and surfaces that cannot be measured by conventional spectrophotometers, it is highly suitable for optical components and small electronic components.

Real measurement function
Various spectroscopic measurements of reflectivity, film thickness, object color, transmittance, and reflectivity at an incident angle of 45 degrees can be performed with just one device.

◆ Measure reflectance
Measure the reflectivity of small dots with a focal length of 17 to 70 μ m using an objective lens.

◆ Measure film thickness
Utilize reflectance data to measure the thickness of single-layer and multi-layer films ranging from approximately 50nm to 10 μ m.

◆ Determine the color of an object
Display XY chromaticity diagram, L * a * b chromaticity diagram, and related values based on reflectance data.

◆ Measure transmittance
Measure the transmittance of the planar sample by passing parallel light with a diameter of 2mm through the lower part of the receiver. Optional

Measure the reflectivity at an incident angle of 45 degrees
Reflect parallel light with a diameter of 2mm from the side towards a 45 degree plane and measure its reflectivity. Optional

High precision and high-speed determination of domain

◆ Achieve high-speed measurement
Using a planar grating and line sensor for full wavelength simultaneous spectral measurement, thus achieving high-speed measurement.

◆ Suitable for measuring the reflectivity of small components and lenses
A new objective lens has been designed that can perform non-contact measurements in the measurement area of φ 17~70 μ m. Conventional spectrophotometers can achieve highly reproducible measurements of small electronic components or curved surfaces such as lenses that cannot be measured.

When measuring reflectivity, there is no need for back anti reflection treatment
By combining the objective lens with annular illumination, it is possible to measure the reflectivity * of the thinnest 0.2mm without the need for anti reflection treatment on the back of the object being tested.

◆ Optional film thickness measurement methods
USPM-RU-W Near Infrared MicrospectrometerAnalyze the film thickness of single-layer or multi-layer films based on the measured spectral reflectance data. The measurement method of * can be selected according to the purpose.

: Specifications
	Reflectance measurement			Transmittance measurement*1	45 degree reflectance measurement*1
name	Near infrared microspectroscopy analyzer			Near infrared microspectroscopy analyzer By measuring the selection of accessories	Near infrared microspectroscopy analyzer 45 degree reflectance measurement optional accessories
model	USPM-RU-W
wavelength measurement	380～1050nm
Determination method	Comparative determination of reference samples			Measurement of transmittance for * benchmark	Comparative determination of reference samples
Measurement range	Refer to the following specifications for the objective lens			About ø 2.0mm
Measurement Reproducibility (3 σ) * 2	Reflectance measurement	When using 10 x and 20 x objective lenses	Below ± 0.02% (430-1010nm) Within ± 0.2% (excluding the above)	Below ± 1.25% (430-1010nm) Within ± 5.0% (excluding the information on the left)
		When using a 40x objective lens	Below ± 0.05% (430-950nm) Within ± 0.5% (excluding the above)
	Thick film measurement	± 1%		-
Wavelength display decomposition energy	1nm
Lighting accessories	Halogen lamp light source JC12V 55W (average lifespan of 700h)
Displacement platform	Bearing surface size: 200 (W) × 200 (D) mm Load capacity: 3 kg Work range: (XY) ± 40mm, (Z) 125mm
Tilted receiving platform	－			Bearing surface size: 140 (W) × 140 (D) mm Load capacity: 1 kg Scope of work: (XT) ± 1 °, (YT) ± 1 °
Device quality	Subject: Approximately 26 kg (excluding PC)			Subject: Approximately 31 kg (excluding PC) * 3
	Control power box: approximately 6.7kg
device size	Main body: 360 (W) × 446 (D) × 606 (H) mm			Main body: 360 (W) × 631 (D) × 606 (H) mm
	Control power box: 250 (W) × 270 (D) × 125 (H) mm
Power Specifications	Input specifications: 100-240V (110VA) 50/60Hz
Usage environment	A place without horizontal vibration Temperature: 15-30 ℃ Humidity: 15-60% RH (no condensation)

*The total weight of the assembly transmittance measurement kit and 45 degree reflectance measurement kit is 33kg, consisting of 1 optional component, 2 measurements under our company's measurement conditions, and 3 measurements.

Regarding the objective lens
model	USPM-OBL10X	USPM-OBL20X	USPM-OBL40X
magnification	10x	20x	40x
NA	0.12	0.24	0.24
Measurement range * 4	70μm	34μm	17μm
working distance	14.3mm	4.2mm	2.2mm
The curvature radius of the sample	±5mm～	±1mm～	±1mm～

*4-point diameter